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Desktop resistance thermal evaporation coating instrument

This device features a compact mechatronic design with a chamber measuring Φ246×228mm and a molecular pump set providing a maximum vacuum of ≤8×10⁻⁵Pa. It incorporates three switchable water-cooled resistance evaporation sources and is equipped with an Inficon SQM-160 thickness gauge (precision 0.1A). The system supports sample stage rotation and optional 300°C heating, making it suitable for rapid thin film deposition experiments.

Details

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1. Overview of Equipment and Application Fields

The desktop resistive evaporation coating system is a highly integrated compact vacuum coating device, specifically designed for laboratory environments in universities, research institutes, and corporate R&D centers. Utilizing the principle of resistive heating, this equipment enables the evaporation and deposition of coating materials, widely applied in the preparation of metal films (e.g., gold, silver, aluminum, chromium), alloy films, and certain low-melting-point dielectric films. Its compact size allows it to be placed independently on a workbench or even stored in a glove box for operation, perfectly meeting the special preparation requirements for water-and oxygen-sensitive materials. It serves as an ideal tool for nanomaterial research, microelectronic device fabrication, and optical thin film experiments.

2. Core Functional Highlights

· The three-source switching evaporation system is equipped with three independent water-cooled resistance evaporation sources, with anti-contamination plates installed between the sources to prevent cross-contamination. Users can flexibly switch between different evaporation sources via the control system to achieve continuous deposition of multiple materials or alloy film preparation, significantly enhancing experimental efficiency.

· High-precision film thickness monitoring is achieved through the imported Inficon SQM-160 quartz crystal oscillator system, paired with a single water-cooled probe, delivering a control accuracy of 0.1A. The system continuously monitors deposition rate and total thickness, ensuring precise controllability and high repeatability of thin film parameters.

· The intelligent PLC touch control system employs a PLC + touchscreen smart control system with a user-friendly interface and simple operation. The system features advanced functions such as self-diagnosis and alerts for air leaks, self-diagnosis and maintenance prompts for communication failures, reducing equipment maintenance difficulty and ensuring experimental safety.

· Flexible sample stage configuration

o Rotation feature: The sample stage speed is adjustable from 0 to 20 rpm, effectively improving the uniformity of large-area coating.

o Optional heating: The substrate stage can be equipped with heating functionality, capable of reaching a maximum temperature of 300±1, to meet substrate heat treatment requirements under specific processes.

o Removable design: The sample holder measures 60×60mm and features a detachable structure for quick sample replacement and easy cleaning maintenance.

· The high-efficiency vacuum acquisition system employs a combination of a mechanical pump (TRP-12) and a Pfeiffer molecular pump (Hipace80), coupled with a GDC-25b electromagnetic baffle valve, ensuring robust pumping speed. It achieves atmospheric pumping to 8×10⁻⁴ Pa in 30 minutes, with an ultimate vacuum degree of up to 8.0×10⁻⁵ Pa, providing a pristine environment for high-quality film formation.

3. Technical Parameters and Specifications

Parameter item

qualification

vacuum chamber

Size: Φ246 × 228 mm

Material: 1Cr18Ni9Ti stainless steel, argon arc welding

Features: Compact overall structure, supports glove box operation

vacuum performance

Extreme vacuum: 8.0×10⁻⁵ Pa

Extraction time: atmosphere 8×10⁻⁴ Pa 30 min

Vacuum measurement: Full-range compound vacuum gauge (10⁵ ~ 10⁻⁵ Pa)

vacuum system

Pre-stage: Mechanical pump (TRP-12,3 L/s)

High vacuum: Pfeiffer molecular pump (Hipace80,67 L/s)

Valve: GDC-25b Electromagnetic Baffle Valve

evaporation source system

Number: 3 sets of water-cooled resistance evaporation sources

Switching mode: Manual/automatic switching between 3 groups, with anti-fouling plate

Power supply: DC steam generator, continuously adjustable from 0 to 2000W

film thickness control

Model: Imported Inficon SQM-160

Probe: Single water-cooled probe

Control accuracy: 0.1 A

sample holder system

Size: 60 x 60 mm (removable)

Rotation speed: 0 to 20 r/min (adjustable)

Heating function: Optional, maximum 300±1°C

navar

PLC + touch screen intelligent control

Functions: Leak self-check, Communication fault self-check, Maintenance prompt

coolant passage

Water pressure: 0.2 to 0.4 MPa

Water temperature: 10 25

Object: Evaporation source, molecular pump, film thickness probe, and other water-cooled components

Device Appearance and Power Supply

Dimensions: L60cm × W60cm × H80cm (mechatronic frame)

Interface: Reserved 1 CF35 flange port

Power supply: 220V, single-phase three-wire system, total power 2KW

4. Why choose the desktop resistance thermal evaporation coating machine?

This desktop resistive evaporation coating system achieves the perfect balance of high performance and compact design. Its glovebox-compatible architecture effectively addresses challenges in sensitive material preparation, while Inficon's precision thickness control and three-source switching system ensure both professional rigor and operational flexibility. The intelligent PLC control system simplifies operation to an unprecedented level, enabling even beginners to master the process quickly. For laboratories with limited space but high demands for film quality, this system stands as the optimal solution to enhance research efficiency and reduce operational costs.